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相位掩模板其本質(zhì)上也是一種光柵,光通過相位掩模板發(fā)生衍射,由于其特殊的結(jié)構(gòu),光的0級衍射被抑制,±1級衍射被增強(qiáng)。±1級的光打在光纖的纖芯上,致使纖芯的折射率發(fā)生改變,形成光柵,從而用于在光纖中刻寫光纖光柵。
特點(diǎn):
0/-1 order Phase mask
Holographically patterned, RIE etched
100% Class 10 cleanroom production
0.01 nm period accuracy and uniformity
Uniform period, or with continuous, linear chirp
訂購參數(shù):
參數(shù) |
規(guī)格 |
相位掩膜板周期 |
400nm-2150nm |
工作波長 |
193nm-800nm |
材料 |
UV grade fused silica |
模板周期的最高精度可達(dá) |
±0.01nm |
周期的均勻性 |
±0.01nm |
啁啾率 |
0-20nm/cm |
模板柵結(jié)構(gòu)尺寸 |
10mmx10mm 25mmx10mm 50mmx10mm 100mmx10mm |
衍射效率 |
0級衍射≤3%,±1級衍射≥33% |
Important Notice
Performance figures, data and any illustrative material provided in this data sheet are typical and must be specifically confirmed in writing by F-tone Networks before they become applicable to any particular order or contract. In accordance with the F-tone Networks policy of continuous improvement specifications may change without notice.
The publication of information in this data sheet does not imply freedom from patent or other protective rights of F-tone Networks or others. Further details are available from any F-tone Networks sales representative.